Magnetron Sputtering Coating Materials with Different Sputtering Targets

Type: Alloy Target
Shape: Plate
Certification: ISO
Transport Package: Vacuum Packaging
Specification: Dia25.4mm, 50.8mm, 101.6mm etc
Trademark: RongSin
Customization:
Manufacturer/Factory, Trading Company
Gold Member Since 2022

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Guangdong, China
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Basic Info.

Origin
China
Production Capacity
500tons/Month

Product Description

Product Description
Sputtering target
A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film
deposition. ... As a result, most sputtering target materials are metallic elements or alloys, although there are some ceramic targets available that create hardened thin coatings for various tools.

 
Oxides Sputtering Target
Ag2O
Al2O3
AZO
B2O3
BaxSr1-xTiO3
BaFe1219
BaO
BaTiO3
Bi2O3
Bi2Se3
BiFeO3
Ca5(PO4)3(OH)
CaO
Cd2SnO4
CdO
CoFe2O4
CoO
Co3O4
Cr2O3
Cr/SiO
CuO
Cu2O
CuAlO2
DyFeO3
Dy2O3
Er2O3
Eu2O3
 
Fe2O3
Fe3O4
GeO2
In2O3
In2O3/Ga2O3/ZnO
In2O3/ZnO
LaMnO3
LaNiO3
LaxSryMnO3
Li3PO4
LiCoO2
LiFePO4
LiMn2O4
LiNbO3
MgAl2O4
MnO
MnO2
Mo2C
MoO3
NiFe2O4
NiO
PbTiO3
PbZr0.52Ti0.48O3
Sc2O3
SnO
SnO2
SrTiO3
TeO2
V2O5
VO2
WO3
Y3Fe5O12
ZnO
ZnO+Al2O3
YSZ(ZrO2/Y2O3)
ITO
IZO
AZO
IAZO
IGZO
GZO
FTO
Y2O3
ATO(Sb2O3/SnO2)
LaAlO3

Sulfides Sputtering Target
 
Sb2S3
BaS
Bi2S3
CdS
CaS
Cr2S3
CuS
GeS
In2S3
FeS
PbS
MgS
MnS
MoS2
SiS2
TaS2
SnS2
WS2
ZnS
Ag2S
As2S3
NbS
Li2S
Li3PS4
 

Fluorides Sputtering Target
 
AlF3
BaF2
CaF2
CdF2
CeF3
CsF
CrF3
DyF3
ErF3
GdF3
HfF4
LiF
LaF3
MgF2
MnF2
SmF3
Na5Al3F14
NaF
SrF2
TbF3
ThF4
SnF2
TiF3
YbF3
YF3
ZnF2
ZrF4
PbF2
 
 

Tellurides Sputtering Target
 
AlTe
Sb2Te3
Bi2Te3
CdTe
Ga2Te3
GeTe
In2Te3
PbTe
MnTe
MoTe2
NbTe2
NiTe
TaTe2
SnTe
WTe2
ZnTe
Li2Te
 
 
 

Pure Metal Sputtering Target
 
Aluminum
Antimony
Barium
Bismuth
Boron
Cadmium
Calcium
Cerium
Chromium
Cobalt
Copper
Dysprosium
Erbium
Europium
Gadolinium
Germanium
Gold
Carbon
Hafnium
Holmium
Indium
Iridium
Iron
Lanthanum
Lead
Lithium
Lutetium
Magnesium
Manganese
Molybdenum
Neodymium
Nickel
Niobium
Palladium
Platinum
Praseodymium
Rhenium
Rhodium
Samarium
Scandium
Selenium
Silicon
Silver
Tantalum
Tellurium
Terbium
Thulium
Tin
Titanium
Tungsten
Vanadium
Ytterbium
Yttrium
Zinc
Zirconium

Alloy Targets 
AlB
AlCr
AlMg
AlSi
AlTi
AlZr
CoFe
CoFeB
CrGe
CuSe
Cu2Se
FeCrAl
FeMn
FePt
FeZr
GaSb
HfSi
InSb
NiCr
NiCrAl
NiCrSi
NiCu
NiMn
NiTi
NiV
NiZr
ScAl
TaAl
TaMo
SnZn
TiAl
TiAlV
TiAlSi
TiCo
TiN
TiW
ZnAl
ZnCu
GuInGaSe
AuGe
AuTi
AuCu
AuSn
AuNi
AgCu
SnAgCu
IrMn
IrPt
PtMn
 


Nitrides Sputtering Target
AlN
BN
Cr2N
HfN
NbN
Si3N4
TaN
TiN
ZrN


Carbide Sputtering Target
 
B4C
Cr3C2
HfC
Fe3C
Mo2C
NbC
SiC
TaC
TiC
WC
VC
ZrC

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Gold Member Since 2022

Suppliers with verified business licenses

Manufacturer/Factory, Trading Company
Registered Capital
5000000 RMB
Plant Area
501~1000 square meters